Обозначение | Заглавие на русском языке | Статус | Язык документа | Цена (с НДС 20%) в рублях |
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Semiconductor devices - Integrated circuits - Part 5: Semicustom integrated circuits
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Published |
На языке оригинала
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1411,00
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Semiconductor devices—Part 16-10: Technology Approval Schedule for monolithic microwave integrated circuits
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Published |
На языке оригинала
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3427,00
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Micro-electromechanical system technology - General rules for the assessment of micro-mechanical parameters
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Published |
На языке оригинала
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1210,00
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Micro-electromechanical system technology - General rules for the assessment of micro-geometrical parameters
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Published |
На языке оригинала
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1210,00
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Silicon-based MEMS fabrication technology - The basic regulation of layout design
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Published |
На языке оригинала
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1210,00
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Silicon-based MEMS fabrication technology - Specification for KOH etch process
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Published |
На языке оригинала
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1058,00
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Silicon-based MEMS fabrication technology - Specification for the dissolved wafer process
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Published |
На языке оригинала
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1210,00
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Silicon-based MEMS fabrication technology - Measurement method of cutting and pull-press strength of micro bonding area
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Published |
На языке оригинала
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1613,00
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Silicon-based MEMS fabrication technology—Specification for criterion of the SOI wafer based MEMS process
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Published |
На языке оригинала
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1210,00
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Silicon-based MEMS fabrication technology—Specification for criterion of the bulk silicon piezoresistance process
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Published |
На языке оригинала
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1814,00
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Silicon-based MEMS fabrication technology—Specification for criterion of the combination of the deep etching and bonding process
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Published |
На языке оригинала
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1411,00
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Nanotechnologies—Electrical operating parameter test specification of wafer level nano-scale phase change memory cells
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Published |
На языке оригинала
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1411,00
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Wafer level test methods for MEMS piezoresistive pressure-sensitive die performances
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Published |
На языке оригинала
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1210,00
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Test methods of the performance for MEMS high g accelerometer
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Published |
На языке оригинала
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1210,00
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Micro-electromechanical system technology—Measuring method for in-plane length measurements of MEMS microstructures using an optical interferometer
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Published |
На языке оригинала
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1058,00
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Micro-electromechanical system technology—Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer
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Published |
На языке оригинала
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1210,00
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Micro electromechanical system technology—Test method for the nonlinear vibration of the MEMS resonant sensitive element
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Published |
На языке оригинала
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1210,00
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Micro-electromechanical system technology—Measuring method of microstructure surface stress based on Raman spectroscopy
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Published |
На языке оригинала
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1210,00
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Micro-electromechanical system technology—Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer
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Published |
На языке оригинала
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1210,00
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Microwave circuits—Measuring methoels for noise source
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Published |
На языке оригинала
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1058,00
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